DFM Methods and Tools for Photonic Systems
AIM Photonics via State University of New York (SUNY)
CO-PI:Clint Schow John Bowers Larry Coldren Yuan Xie
Area/s of Research:Electronics & Photonics
The objective of this joint project (integrating components initially proposed separately by MIT and UCSB) is to develop design-for-manufacturability (DFM) methods and tools for photonic systems. Variation-aware compact models and analysis methods will be incorporated into existing electronic and photonic design and simulation tools, and used in target KTMAs as drivers to design and optimize greater integration and high-yield manufacturing. This project will address silicon photonics, as well as lasers and III-V integration with silicon. The developed models will be validated by experimental measurements.